Titanium Sputtering Target — 99.9% Purity
Why Choose This Product
Dimensions & Range
| Purity | ≥ 99.9% Ti |
| Density | ≥ 99% theoretical |
| Max Length | 3000 mm (rotary) |
| Max Diameter | 300 mm (round) |
Testing & Inspection
| Test Type | Method | Standard |
|---|---|---|
| Chemical Analysis | OES / XRF Spectrometry | ASTM E1409 / E1447 |
| Tensile Test | Universal Testing Machine | ASTM E8 / ISO 6892-1 |
| Hardness Test | Brinell / Vickers | ASTM E10 / E92 |
| Ultrasonic Testing (UT) | 100% automated inspection | ASTM E213 |
| Eddy Current (ECT) | High-speed automated scan | ASTM E309 |
| Hydrostatic Test | Per specification pressure & hold | ASTM B338 |
| Dimensional Inspection | Micrometer / Laser gauge | ISO 2768 |
Overview
High-purity (≥99.9%) titanium sputtering targets for PVD deposition of TiN, TiAlN, TiO2, and pure Ti films. Used in semiconductor metallization, hard coating, solar cell, and optical thin film applications. Available in round, rectangular, and rotary configurations.
Packaging & Delivery
Standard Export Packaging
Each order is packed in ISPM-15 certified heat-treated wooden crates, suitable for sea, air, and land freight worldwide.
All products are wrapped with VCI (Volatile Corrosion Inhibitor) film to prevent oxidation during transit.
Standard lead time is 10–25 working days. Rush orders and custom OEM packaging available on request.
Product Overview
Supply Capability
300 T
Monthly Capacity
3
Factories
8+
Production Lines
100+
Machines
Get a Quote for This Product
- Reply within 4 business hours
- ASTM / AMS certified material
- Custom spec & OEM available
- Free sample available
- Worldwide shipping