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Sputtering Target

Titanium and titanium alloy sputtering targets for PVD thin-film deposition in semiconductor and optical coating industries.

Titanium Sputtering Target — 99.9% Purity

High-purity (≥99.9%) titanium sputtering targets for PVD deposition of TiN, TiAlN, TiO2, and pure Ti films. Used in semiconductor metallization, hard coating, solar cell, and optical thin film applications. Available in round, rectangular, and rotary configurations.

ISO 9001

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